EUV Photomask Technology

Accelerating the future at 13.5 nanometers.

Astrileux designs and manufactures extreme ultraviolet photomasks for the leading edge of semiconductor production — the reticles that pattern the chips behind AI, connectivity, and everything computing is about to become.

See the Photomask Why Lithography Matters

13.5nmEUV Wavelength

<3nmProcess Nodes Enabled

ISSOn-Orbit R&D

5Federal & Institutional Partners

YottabyteScale of Data Ahead

Agentic AIChips We're Built For

SpaceWhere We Prototype

Explore

Three ways into what Astrileux is building.

01 — Technology

The leading edge, explained.

Yottabyte-scale computing, generative and agentic AI chips, the scale of global connectivity, and how EUV lithography makes all of it physically possible.

Read the primer → 02 — Products & Space

The EUV photomask, made on orbit.

Astrileux's photomask program and its work aboard the International Space Station — AI's blueprint, made in space.

See the product → 03 — Funders

Who's backing this work.

NSF, NASA, CASIS, Draper, and E2MC — the federal and institutional partners funding Astrileux's photomask and space programs.

Meet our funders →

"AI's blueprint, made in space." Astrileux is testing EUV photomask processes in microgravity aboard the ISS National Laboratory — work that could change where the most critical layer of chipmaking happens.

Read about our space program

Investor Relations

Building the reticle layer for the next decade of compute.

We're raising to scale EUV photomask production and our on-orbit manufacturing program. Get in touch.

Contact Astrileux